Plasma Chemistry and Plasma Processing Impact Factor in Chemistry Journals

About Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing is a journal covering the technologies/fields/categories related to Chemical Engineering (miscellaneous) (Q2); Chemistry (miscellaneous) (Q2); Condensed Matter Physics (Q2); Surfaces, Coatings and Films (Q2). It is published by Springer New York. The overall rank of Plasma Chemistry and Plasma Processing is 8958.According to SCImago Journal Rank (SJR), this journal is ranked 0.577. SCImago Journal Rank is an indicator, which measures the scientific influence of journals. It considers the number of citations received by a journal and the importance of the journals from where these citations come. SJR acts as an alternative to the Journal Impact Factor (or an average number of citations received in last 2 years). This journal has an h-index of 72. The best quartile for this journal is Q2.The ISSN of Plasma Chemistry and Plasma Processing journal is 02724324, 15728986.An International Standard Serial Number (ISSN) is a unique code of 8 digits. It is used for the recognition of journals, newspapers, periodicals, and magazines in all kind of forms, be it print-media or electronic. Plasma Chemistry and Plasma Processing is cited by a total of 1010 articles during the last 3 years (Preceding 2022).